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MUST2
SAMURAI_2018
S3-LEB-LPC
SUPERNEMO
MUGAST
EXPAND
SCALP
GALATRON
HiCARI
VELO
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Not logged in |
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Message ID: 4265
Entry time: Mon Apr 15 15:18:55 2019
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| Author: |
A. Lemasson |
| ExpNbr: |
e744s |
| Type: |
VAMOS |
| Category: |
Hardware |
| Status: |
Fixed |
| Target-Source: |
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| Subject: |
Optimization of IC Shaping |
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During Run 129,
1) investigation of the trapezoidal filter of IC
2) The Conclusion is that if we reduce the shaping to 2.5 us we reduce the random line in IC vs IC (At 1e5 in VAMOS : Random Line / Peak is 18.5 % compared to 40% for shaping of 3us)
3) The 2.5us us also optimum for the resolution (oscillation of the abse line after the filter very sensitive to K, with freq of ~500Khz)
/!\ Increasing intensity during the study
Flat Top 1.07 , 320ns k+0.5M
K sigma
0.5 81 530
1.0 236 1038 0.53
1.5 161 1549 0.25
2. 215 2039 0.247
2.5 156 2554 0.1435
3. 260 3082 0.196
Changing N
320 2.5 126 2554 0.116
160 2.5 126 2554 0.116
40 2.5 130 2554 0.119
Chnging Q
2980 40 2.5 130 2554 0.1119
3300 40 2.5 134 2554 0.123
Chnging M
1070 3300 40 2.5 134 2554 0.123
500 2900 40 2.5 145 2554 0.133
750 3000 40 2.5 145 2554 0.133
-> Final Setting is
M Q N K
1070 3200 160 2.5 -> 126/2554 -> 0.116 |
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